We are pleased to announce our participation in the MNE 2016 – the 42nd International Conference on Micro- and Nanofabrication and Manufacturing using Lithography and Related Techniques in Vienna (Austria), 19-23 September 2016 (http://mne2016.org).

You can meet our team during the commercial exhibition at booth no 33, where we will inform about our innovative photoresists, special polymers and ancillary materials for micro- and nanolithography applications.

Furthermore, micro resist technology will contribute to the EVG Technology Workshop 2016, Advances in Nanoimprint Lithography on Monday, September 19th 2016 (http://www.evgroup.com/en/about/events/evgtechnologyworkshop16):

Oral presentation

“Material Innovations Enabling Value Chains for High Volume Fabrication by Nanoimprint Lithography” by Dr. Arne Schleunitz