We are pleased to announce our participation in the NNT 2016 – the 15th International Conference on Nanoimprint & Nanoprint Technology in Braga (Portugal), 26-28 September 2016 (www.nntconf.org).

You can meet our team during the commercial exhibition, where we will inform about our innovative NIL resists, special polymers and ancillary materials for micro- and nanolithography applications.

Furthermore, micro resist technology will contribute to the scientific program with the following presentation:

Oral presentation

“Advancing manufacturing route for multi-level diffractive optical elements by combining nanoimprint lithography and LiGA process” by Dr. Loïc Jacot-Descombes