We are pleased to announce our participation in the SPIE Photonics West Exhibition 2017 in San Francisco (USA), January 28th – February 2nd 2017 (http://spie.org/x2584.xml).

You can meet our team in the German Pavilion, where we will inform about our innovative photoresists, special polymers and ancillary materials for micro- and nanolithography applications as well as UV-curable hybrid polymers suitable for the manufacture of micro-optics and waveguide applications.


Furthermore, micro resist technology will contribute to the scientific program with the following presentation:

Oral presentation

“Evaluation of hybrid polymers for high-precision manufacturing of 3D optical interconnects by two-photon absorption lithography” by Dr. Arne Schleunitz