Diffraktive optische Elemente (DOE)

Dry etching and DRIE (etch mask for semiconductors and metals)

Deep-UV lithography

ma-N 2400 & mr-EBL 6000 series

Lab-on-a-Chip

OrmoClear® Series
UV-curable liquid silicone rubber / UV-PDMS

Electroplating templates

Leuchtdioden (LED)

mr-I 9000M series
mr-NIL 6000E series
ma-N 400 & ma-N 1400 series
UV-curable liquid silicone rubber / UV-PDMS

Electron-beam lithography

ma-N 2400 & mr-EBL 6000 series

Nano- und Mikroelektronik

ma-N 2400 & mr-EBL 6000 series
mr-I 9000M series
mr-NIL 6000E series
mr-UVCur21 series
UV-curable liquid silicone rubber / UV-PDMS

Mikrofluidik und Mikro-Bio-Fluidik

OrmoClear® Series
UV-curable liquid silicone rubber / UV-PDMS

Physical vapour deposition (PVD)

mr-I 9000M series
mr-NIL 6000E series
mr-UVCur21 series
ma-N 400 & ma-N 1400 series

Optische Wellenleiter

EpoCore & EpoClad Serien
OrmoCore and OrmoClad

Roll-to-roll processes

Organische Elektronik

Thermal reflow

Patterned sapphire substrates (PSS)

Two-photon absorption lithography

Semiconductor components

ma-N 2400 & mr-EBL 6000 series
mr-I 9000M series
mr-NIL 6000E series
mr-UVCur21 series
ma-N 400 & ma-N 1400 series

UV lithography

Nanoimprint working stamp

UV-curable liquid silicone rubber / UV-PDMS

UV molding

OrmoClear® Series
OrmoCore and OrmoClad
UV-curable liquid silicone rubber / UV-PDMS

Wafer-level-optics

Greyscale lithography

Wire-grid polarizers

3D microstructures

Inkjet-printing

High-aspect ratio patterning

Laser direct writing lithography

Lift-off patterning

ma-N 400 & ma-N 1400 series

Nanoimprint lithography (thermal) for pattern transfer

Nanoimprint lithography (thermal) for permanent application

Nanoimprint lithography (UV- or photo-NIL) for pattern transfer

Nanoimprint Lithographie (UV- oder Photo-NIL) für Permanentanwendung

Nanoimprint lithography - combined thermal and UV-NIL

mr-NIL 6000E series