Diffractive optical elements (DOE)

Lab-on-a-chip

OrmoClear® Series
UV-curable liquid silicone rubber / UV-PDMS

Light-emitting diodes (LEDs)

mr-I 9000M series
mr-NIL 6000E series
ma-N 400 & ma-N 1400 series
UV-curable liquid silicone rubber / UV-PDMS

Nano- and micro-electronics

ma-N 2400 & mr-EBL 6000 series
mr-I 9000M series
mr-NIL 6000E series
mr-UVCur21 series
UV-curable liquid silicone rubber / UV-PDMS

Micro-fluidics and Micro-bio-fluidics

OrmoClear® Series
UV-curable liquid silicone rubber / UV-PDMS

Optical waveguides

EpoCore & EpoClad Serien
OrmoCore and OrmoClad

Organic electronics (e.g. OLED)

Patterned sapphire substrates (PSS)

Semiconductor components

ma-N 2400 & mr-EBL 6000 series
mr-I 9000M series
mr-NIL 6000E series
mr-UVCur21 series
ma-N 400 & ma-N 1400 series

Wafer-level-optics

Wire-grid polarizers

3D microstructures

High-aspect ratio patterning

Dry etching and DRIE (etch mask for semiconductors and metals)

Deep-UV lithography

ma-N 2400 & mr-EBL 6000 series

Electroplating templates

Electron-beam lithography

ma-N 2400 & mr-EBL 6000 series

Greyscale lithography

Inkjet-printing

Laser direct writing lithography

Lift-off patterning

ma-N 400 & ma-N 1400 series

Nanoimprint lithography (thermal) for pattern transfer

Nanoimprint lithography (thermal) for permanent application

Nanoimprint lithography (UV- or photo-NIL) for pattern transfer

Nanoimprint lithography (UV- or photo-NIL) for permanent application

Nanoimprint lithography - combined thermal and UV-NIL

mr-NIL 6000E series

Nanoimprint working stamp

UV-curable liquid silicone rubber / UV-PDMS

Physical vapour deposition (PVD)

mr-I 9000M series
mr-NIL 6000E series
mr-UVCur21 series
ma-N 400 & ma-N 1400 series

Roll-to-roll processes

Thermal reflow

Two-photon absorption lithography

UV lithography

UV molding

OrmoClear® Series
OrmoCore and OrmoClad
UV-curable liquid silicone rubber / UV-PDMS