We are pleased to announce our participation in the MNE 2017 – the 43rd International Conference on Micro- and Nanofabrication and Manufacturing using Lithography and Related Techniques in Braga (Portugal), 18-22 September 2016 (http://mne2017.org).

You can meet our team during the commercial exhibition at booth no C2.3, where we will inform about our innovative photoresists, special polymers and ancillary materials for micro- and nanolithography applications.

Furthermore, micro resist technology will contribute to the technical program with the following presentations:

Oral presentation

“Photoresists and photopolymers for next generation micro- and nanolithography - Innovations for lab to fab applications” by Dr. Arne Schleunitz, Industrial Session

Poster presentation

“Functional material for one step UV-NIL manufacturing of disposable microfluidic devices” by Dr. Mirko Lohse, Poster Session