MNE2017 in Portugal - 18 - 22 September 2017
We are pleased to announce our participation in the MNE 2017 – the 43rd International Conference on Micro- and Nanofabrication and Manufacturing using Lithography and Related Techniques in Braga (Portugal), 18-22 September 2016 (http://mne2017.org).
You can meet our team during the commercial exhibition at booth no C2.3, where we will inform about our innovative photoresists, special polymers and ancillary materials for micro- and nanolithography applications.
Furthermore, micro resist technology will contribute to the technical program with the following presentations:
“Photoresists and photopolymers for next generation micro- and nanolithography - Innovations for lab to fab applications” by Dr. Arne Schleunitz, Industrial Session
“Functional material for one step UV-NIL manufacturing of disposable microfluidic devices” by Dr. Mirko Lohse, Poster Session