The table contains summarised information on recommended process chemicals for negative photoresists.

Detailed information, such as recommendations for different substrates, film thicknesses and applications, can be found in the processing guidelines.

Thinner

Negative resist series Thinner
ma-N 2400

mr-T 1090

ma-N 400

mr-T 1049

ma-N 1400

ma-T 1046

mr-UVL 6000

ma-T 1045

mr-EBL 6000

ma-T 1045

Primer

Negative resist series Primer
ma-N 2400

SurPass 4000

ma-N 400

HMDS, SurPass 4000

ma-N 1400

HMDS, SurPass 4000

EpoCore

SurPass 3000

EpoClad

SurPass 3000

mr-DWL

SurPass 3000

mr-UVL6000

SurPass 3000

mr-EBL 6000

SurPass 3000

Developer

Negative resist series Aqueous-alkaline based Solvent based
ma-N 2400

ma-D 525 (TMAH based)
ma-D 331, ma-D 332 (NaOH based)

-

ma-N 400

ma-D 531/S, ma-D 532/S (TMAH based)
ma-D 331/S, ma-D 332/S (NaOH based)

-

ma-N 1400

ma-D 533/S (TMAH based)

-

EpoCore

-

mr-Dev 600

EpoClad

-

mr-Dev 600

mr-DWL

-

mr-Dev 600

mr-UVL6000

-

mr-Dev 600

mr-EBL 6000

-

mr-Dev 600

Remover: mr-Rem 700 (NMP & NEP free), mr-Rem 400/ 500 (NMP free), mr-Rem 660 (NMP)

Negative resist series    Solvent based Strongly alkaline based
ma-N 2400 mr-Rem 700, mr-Rem 500, mr-Rem 660, (mr-Rem 400) (ma-R 404/S)
ma-N 400 mr-Rem 700, mr-Rem 500, mr-Rem 660, (mr-Rem 400) (ma-R 404/S)
ma-N 1400 mr-Rem 700, mr-Rem 500, mr-Rem 660, (mr-Rem 400) (ma-R 404/S)
EpoCore mr-Rem 700, mr-Rem 500, mr-Rem 660 -
EpoClad    mr-Rem 700, mr-Rem 500, mr-Rem 660 -
mr-DWL mr-Rem 700, mr-Rem 500, mr-Rem 660 -
mr-UVL6000 mr-Rem 700, mr-Rem 500, mr-Rem 660 -
mr-EBL 6000 mr-Rem 700, mr-Rem 500, mr-Rem 660 -

Chrome Etching Solution

Metal Etchant
Chrome

Chrom etch 18