OrmoStamp®FF

Unique Features

Highly transparent for near UV and visible light
High thermal and mechanical stability
Enhanced anti-adhesive properties for low release forces
Processing with standard lithography equipment
PFAS free
To further improve demolding, the application of an anti-adhesion layer is recommended (e.g. by vapor deposition of F13-TCS (1H,1H,2H,2H-prfluorooctyl-trichlorosilane, CAS number [78560-45-9]

Applications

Transparent working stamp fabrication
Cost efficient alternative to quartz stamps
UV-based and thermal imprinting, nanoimprint lithography

OrmoStamp®FF offers glass-like properties after UV curing and was designed for the fabrication of transparent polymer working stamps with excellent pattern fidelity OrmoStamp®FF is the fluorine-free advancement of the tried and tested OrmoStamp® and will replace this material. In order to achieve maximum transparency, a further flood exposure with up to 20 J/cm-2 can be carried out after the separation of the master and OrmoStamp®FF copy, depending on the layer thickness

For UV-based and thermal imprinting

Viskosität [Pa∙s]	0.5 ± 0.1
Schichtdicke via Spin Coating [µm] 3000 rpm 6000 – 1000 rpm	10 5 – 35
Aushärtewellenlängen [nm]	300 – 410
Empfohlene Belichtungsdosis [mJ/cm²]	1000
Schrumpfung [%]	4 -6
Brechungsindex (ausgehärtet, 589 nm)	1.516
Abbe-Zahl	47
CTE (20-150 °C) [ppm/K]	140
dn/dT [10^-4/K]	-1.5
Young‘s modulus [GPa]	~1.8
Härte Shore D	>80
Thermische Stabilität	Bis zu 270 °C (kurzzeitig)
Abformung mit PDMS-Stempel (keine Sauerstoffempfindlichkeit)	Ja
Auflösung	Hohe Auflösung bis zu 100 nm Strukturen
Haltbarkeit	6 Monate
Lösungsmittelfrei	Ja, gebrauchsfertige Formulierungen

quotation request

Hybrid Polymers, Positive Photoresists

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Manufacturing Microlens Arrays by Reflow and UV Moulding

A cost-efficient method for the manufacturing of micro lens arrays is the reflow of patterned positive resists ma-P 1200G or ma-P 1200 and subsequent pattern transfer using OrmoStamp® or OrmoComp®.

Positive Photoresists

Hybrid Polymers

Thermal reflow

3D microstructures

Micro Optics

Wafer-level-optics

ma-P 1200 series / ma-P 1275HV

ma-P 1200G series

OrmoStamp

OrmoComp

23. Juni 2020

Hybrid Polymers, Positive Photoresists

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Optical 3D patterning by greyscale lithography and UV moulding

An excellent method for the manufacturing of optical 3D structures is grayscale patterning of positive resist ma-P 1200G and subsequent pattern transfer by UV moulding using OrmoStamp® and OrmoComp®.

Positive Photoresists

Hybrid Polymers

Greyscale lithography

Micro Optics

Wafer-level-optics

Nanoimprint lithography (UV- or photo-NIL) for permanent application