Ancillaries

+49 30 641 670 100

info@microresist.de

Resist Alliance

micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.

Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)

We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.

DJ MicroLaminates, Inc.

We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.

Dry Films

Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.

Available in different film thicknesses
UV-crosslinking as negative photoresist
Feasibility of high aspect ratios
Vertical sidewalls
Multi lamination possible – up to 6 layer  complex multi-layer designs
High chemical resilience

Application as permanent material for optical application (e.g. lenses, wave guides …), in micro fluidics

Functional materials for inkjet-printing

Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process

Available in different viscosities (adjustable)
Suitable in commercial inkjet printing devices
Focused on high reliability of droplet generation
UV-curable formulations

Usable as a permanent material for optical application (e.g. lenses, wave guides, optical couplers, diffractive elements, …)
Packaging material in the micro electronic
Deposition / patterning on substrates with surface topography
Imprint material for nano-structuring with high dose accuracy

Nanoimprint Resists

Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.

micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO₂, Al or sapphire.

Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!

Hybrid Polymers

micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.

OrmoComp^®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear^®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp^®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime^®: DE 30 210 075 436

Positive Photoresists

Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography

Variety of viscosities for 0.1 µm – 60 µm film thickness in one spin-coating step
Effective for broadband, g-line, h-line or i-line exposure, laser direct writing at 350…450 nm and e-beam lithography
No post exposure bake
Easy removal
For pattern transfer: Etch mask, mould for electroplating, mould for UV moulding
Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. MEMS, LEDs, ICs, MOEMS, fiber optics telecommunications devices, flat panel displays

Negative Photoresists

Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography

Effective for broadband and i-line, Deep UV, e-beam exposure, or laser direct writing @ 405 nm
Lift-off resists with tunable pattern profile, high temperature stability up to 160 °C
Variety of viscosities for different film thicknesses in one spin-coating step

For pattern transfer: Physical vapour deposition (PVD) and single layer lift-off, etch mask, mould for electroplating
For permanent applications: Polymeric waveguides
Use in microsystems technology, microelectronics, micro-optics – manufacture of e.g. LEDs, ICs, MEMS, flat panel displays, fiber optics telecommunications devices

+49 30 641 670 100

info@microresist.de

ma-D 525

ma-D 531/S

ma-D 532/S

ma-D 533/S

ma-R 404/S

ma-T 1045

ma-T 1046

ma-T 1050

MIBK:IPA series

mr-APS1

mr-Conductive Layer

mr-D 374/S

mr-D 4000/100

mr-D 4000/75

mr-D 526/S

mr-Dev 600