Resist | ma-N 402 | ma-N 405 | ma-N 415 | ma-N 420 | ma-N 440 | ma-N 490 |
Schicktdicke [µm] @ 3000 rpm | 0,2 | 0,5 | 1,5 | 2,0 | 4,1 | 7,5 |
dyn. Viskosität [mPas]
(@ 25 °C, 1000 s-1) |
2,0 | 3,8 | 14 | 23 | 70 | 290 |
Prebake | 95 - 100°C | |||||
Spektrale Empfindlichkeit | 300 - 380nm
i-line - 365 nm |
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Belichtungsdosis @ 365 nm
UV Mercury Lamp/ Breitband UV-LED, Stepper, Laser |
350 – 1.900 mJ/cm2 | |||||
Entwickler | ma-D 331/S (NaOH based)
ma-D 530/S (TMAH based) |
ma-D 331/S (NaOH based)
ma-D 531/S (TMAH based) |
ma-D 332/S (NaOH based)
ma-D 532/S (TMAH based) |
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Entferner | mr-Rem 700 (NMP & NEP free)
mr-Rem 500 (NMP free) ma-R 404/S (strongly alkaline) |
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Lift-off | mr-Rem 700 (NMP & NEP free)
mr-Rem 500 (NMP free) |
Verdünner | ma-T 1049 |
Entwickler | ma-D 331/S, ma-D 332/S (NaOH basiert)
531/S, ma-D 532/S (TMAH basiert) |
Entferner | mr-Rem 700 (NMP & NEP frei)
mr-Rem 500 (NMP frei) ma-R 404/S (stark alkalisch) |
Lift-off | mr-Rem 700 (NMP & NEP frei)
mr-Rem 500 (NMP frei) |
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