Joint Symposium on Direct Write, Optical, Ion and Electron Beam Lithography

Join us for the Symposium, hosted on gather.town. This online event brings together technical experts, customers and users from Nanoscribe, micro resist technology GmbH, Heidelberg Instruments, GenISys GmbH and Raith. Discover the latest technologies and products for Nano-Micro-Lithography. Several system users from the participating companies will provide detailed insights into their microfabrication projects and describe experiences with various products and technologies. In addition, there will be an inspiring student project pitch and numerous networking opportunities to discuss your projects.

For registration please follow the link:

https://www2.heidelberg-instruments.com/l/900241/2021-10-06/2vjng

There you will also find the updated agenda.

Based on the interactive platform gather.town, you have the opportunity to attend presentations in conference rooms, meet all the participating companies at their booths or network with other participants while strolling through the event rooms. Take the chance to get inspiration for your innovation projects, meet micro resist technology and discuss with our experts.

We especially invite you to the talk of our technical expert Johannes Wolf on “Matching lithography processes to implement hierarchical nano-micro-pattern”. In addition, Danny Reuter from TU Chemnitz – Center for Microtechnologies will proceed with his presentation on “Challenges for integration of optical elements”.