ma-D 332/S – Microresist

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ma-D 332/S

Apllication

aqueous-alkaline based & surfactant containing developer for photoresists

Characteristics

- aqueous-alkaline, surfactant containing NaOH based developer for photoresist series: ma-N 400

- Puddle, immersion and spray development

Suitable Resists:

ma-N 400 series

quotation request

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