aqueous-alkaline based developer for photoresists
- aqueous-alkaline NaOH based developer for photoresist series: ma-P 1200, ma-P 1200 G (binary standard lithography) & ma-N 2400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline & surfactant containing NaOH based developer for photoresist series: ma-P 1200 & ma-N 400
- Puddle, immersion and spray development
aqueous-alkaline based developer for photoresists
- aqueous-alkaline NaOH based developer for photoresist series: ma-N 2400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline, surfactant containing NaOH based developer for photoresist series: ma-N 400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline, surfactant containing metasilicate based developer for photoresist series: ma-P 1200 LIL
- Puddle, immersion and spray development
aqueous-alkaline based developer for photoresists
- aqueous-alkaline, metasilicate based developer for photoresist series: ma-P 1200, ma-P 1200 G, ma-N 2400, ma-N 400
- on Al and Al containing substrates
- Puddle, immersion and spray development
aqueous-alkaline based developer for photoresists
- aqueous-alkaline TMAH based developer for photoresist series: ma-N 2400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline & surfactant containing TMAH based developer for photoresist series: ma-N 400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline & surfactant containing TMAH based developer for photoresist series: ma-P 1200 G & ma-N 400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline & surfactant containing TMAH based developer for photoresist series: ma-N 1400
- Puddle, immersion and spray development
aqueous-alkaline based & surfactant containing developer for photoresists
- aqueous-alkaline & surfactant containing TMAH based developer for photoresist series: ma-P 1200 & ma-P 1200 G
- Puddle, immersion and spray development
aqueous-alkaline based developer for dry film photoresists
- aqueous-alkaline, K2CO3 based developer for DuPont dry film photoresists: MX 5000, MX 5000C
- Spray development
aqueous-alkaline based developer for dry film photoresists
- aqueous-alkaline, K2CO3 based developer for DuPont dry film photoresists: WBR 2000
- Spray development
Solvent based developer for epoxy resin based photoresists
- organic solvent based developer for photoresist series: EpoCore, EpoClad, mr-DWL, mr-EBL 6000, mr-UVL 6000, SU-8, SU-8 2000, SU-8 3000, SU-8 TF 6000, SUEX dry films
- Puddle, immersion and spray development
Solvent based developer for dry film photoresists
- organic solvent based developer for ADEX dry film photoresists
- Puddle, immersion and spray development
Developer for hybrid polymers
- Colorless developer based on organic solvent mixture
- Removal of uncured hybrid polymer material (e.g. after mask lithography was applied)
- Immersion development
Solvent based remover for photoresists
- Organic solvent based remover for photoresist series: ma-P 1200, ma-P 1200 G, ma-P 1200 LIL, ma-N 2400, ma-N 400, ma-N 1400, mr-PL, PMMA, LOR, PMGI
- NMP free, NEP containing
- Puddle, immersion and spray development
ma-N 2400 series, ma-N 400 series, ma-N 1400 series, mr-EBL 6000 series, mr-DWL series, EpoCore & EpoClad series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series, InkEpo series, mr-UVCur26SF series, SU-8 series, SU-8 2000 series, SU-8 3000 series, SU-8 TF 6000 series, PMMA/Copolymers, LOR / PMGI series
Solvent based remover for photoresists
- Organic solvent based remover for photoresist series: ma-P 1200, ma-P 1200 G, ma-P 1200 LIL, ma-N 2400, ma-N 400, ma-N 1400, mr-PL, EpoCore, EpoClad, mr-DWL, mr-EBL 6000, mr-UVL 6000, SU-8, SU-8 2000, SU-8 3000, SU-8 TF 6000, PMMA, LOR, PMGI
- NMP & NEP free, DMSO basiert, pH ~ 8
- Puddle, immersion and spray development
ma-N 2400 series, ma-N 400 series, ma-N 1400 series, mr-EBL 6000 series, mr-DWL series, EpoCore & EpoClad series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series, InkEpo series, SU-8 series, SU-8 2000 series, SU-8 3000 series, SU-8 TF 6000 series, PMMA/Co-Polymers, LOR / PMGI series
Strongly alkaline, aqueous based remover for photoresists
- strongly alkaline, aqueous NaOH based remover for photoresist series: ma-P 1200, ma-P 1200 G, ma-P 1200 LIL, ma-N 2400, ma-N 400, ma-N 1400, mr-PL
- Puddle, immersion and spray development
Adhesion promoter for photoresists
- HMDS adhesion promoter on Si, SiO2, and glass substrates
- for photoresist series: ma-N 400, ma-N 1400, ma-P 1200, and ma-P 1200 G
If necessary, please also use the general contact on our website – we will get back to you as soon as possible!
micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.
Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)
We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.
DJ MicroLaminates, Inc.
We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.
Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.
Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process
Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.
micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.
Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!
micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.
OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436
Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography
Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography
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