Our company operates an integrated Quality and Environmental Management System, which forms the foundation for sustainable and customer-focused corporate management. The Quality Management System in accordance with DIN EN ISO 9001 has been successfully certified since 1997, and the Environmental Management System in accordance with DIN EN ISO 14001 since 2011. Both management systems support us in continuously improving the quality of our products and services, using resources responsibly, and ensuring the long-term success of the company.
You can download our current DIN EN ISO 14001 certificate here:
As a subsidiary of the TOK Group, micro resist technology GmbH operates as an independent player in national and international technology markets, including microelectronics and nanoelectronics, microphotonics and nanophotonics, microsystems technology, micro-optics, microfluidics, and microsensors based on semiconductor technology.
The objective of all our activities is, in alignment with our parent company, to keep the environmental footprint of our business as small as possible in order to protect and preserve a healthy natural environment, species diversity, high biodiversity, and a sustainable quality of life. The driving force behind our actions is the ongoing challenge of climate change. Aware of our environmental responsibility, we consider the impact of our activities on the climate and are committed to the continuous improvement of our environmental performance in order to protect the climate and safeguard natural resources and ecosystems.
In addition to our Quality Policy, our Environmental Policy is guided by the following principles:
Every employee shares responsibility for ensuring that the activities of micro resist technology GmbH are conducted in an environmentally responsible manner. Employees are informed about environmental matters, receive appropriate training, and are actively involved in environmental protection initiatives.
Compliance with applicable legal, regulatory, and other binding obligations constitutes the minimum standard for our daily activities. Beyond this, we expect all employees to act in an environmentally and safety-conscious manner within the scope of their responsibilities and capabilities.
Potential risks to people and the environment are minimized through a strong culture of occupational health, safety, and environmental protection. This commitment also applies to contractors and service providers performing work on our premises on our behalf.
Since the founding of micro resist technology GmbH, it has been part of our philosophy to manufacture high-quality products with the lowest possible environmental impact. We lay the foundation for this approach during the research and development of new products and technologies through environmentally responsible raw material selection, including bio-based materials, formulation development, and customer application support.
We provide our customers with products for innovative technologies that offer high material efficiency and the longest possible service life. In doing so, we contribute to resource conservation and cost reduction for our customers.
Changes in the hazard classification of raw materials proactively trigger the development of alternative products that can be used safely by our customers in their processes.
We annually evaluate the environmental impacts of our activities, processes, and products and reduce them to the greatest extent that is technically and economically feasible. Our goal is to prevent pollution and avoid unintended releases into the environment. This includes considering environmental impacts associated with our products throughout their life cycle.
We use energy, raw materials, and operating supplies responsibly and efficiently. Improving resource management, including the conscious use of energy, is an important element of our environmental management system and contributes to minimizing operating costs.
We design our production processes to generate as little waste as possible. Selected cleaning solvents used in production are recovered and reused. Hazardous waste is disposed of through certified waste management providers. Through the consistent segregation of waste streams and cooperation with specialized recycling companies, we contribute to the effective recovery and reuse of valuable materials.
We continuously develop and improve our environmental management system. Significant environmental aspects are identified and reviewed annually. Based on these evaluations, measurable environmental objectives are established to enhance our environmental performance.
Achieving our environmental objectives is a key element of our commitment to sustainability, continual improvement, and the prevention of environmental impacts.
Berlin; August 20, 2026
Motoko Samezawa
Managing Director and President
Dr. Arne Schleunitz
Chief Technology Officer (CTO)
Mirjam Henschel
Chief Operating Officer (COO)
micro resist technology is a single entry point for specialty chemicals used in micro and nano manufacturing in Europe. The portfolio of in-house products is complemented by the strategic sales of associated products that are manufactured by our international partners. Here we act as a high-service distributor and offer European medium-sized companies a wide range of complementary products from a single source, which can be used for both established and innovative production and manufacturing processes.
Kayaku Advanced Materials, Inc. (formerly MicroChem Corp.)
We offer photoresists and specialty chemicals for MEMS and microelectronic applications from our partner Kayaku Advanced Materials, with whom we have been working for more than 20 years.
DJ MicroLaminates, Inc.
We offer dry film resists for MEMS, microfluidics and packaging applications from our partner DJ MicroLaminates, with whom we have been cooperating for over two years.
Dry films are ready-to-use polymer films as laminate foil with a high accuracy of the film thickness and excellent adhesion behaviour on various substrates. They are very simple in handling, photo-structurable and both as cut sheets and as roll material available.
Special designed functional materials from the product groups Hybrid Polymers, Photoresists, and Nanoimprint Polymers for the deposition and alternative patterning using inkjet printing process
Nanoimprint Lithography (NIL) is a straight forward, low cost, and high throughput capable technology for the fabrication of nanometer scaled patterns. Main application fields are photonics, next generation electronics, as well as bio- and sensor applications.
micro resist technology GmbH has provided tailor-made resist formulations for nanoimprint lithography (NIL) since 1999. The unique key features of our products are outstanding film forming and imprinting performance beside excellent pattern fidelity and plasma etch stability. Besides our highly innovative material developments in close contact to industrial needs, our strength is the ability to adjust our materials in film thickness as well as addressing certain needs of the specific use cases within the formulation. Our nanoimprint resists are mostly applied as an etch mask for pattern transfer into various substrates, like Si, SiO2, Al or sapphire.
Our portfolio covers materials for the classical thermal NIL (T-NIL), in which a thermoplastic polymer is used, as well as UV-NIL, in which a liquid formulation is photo crosslinked upon photo exposure. With our technological expertise and know-how we are able to find the right material for your process and applications. Please contact us for your technical support!
micro resist technology offers a broad portfolio of UV-curable hybrid polymer products for micro-optical applications. Their excellent optical transparency and high thermal stability makes them perfectly suitable for the production of polymer-based optical components and waveguides. The main fields of application are micro lenses, diffractive optical elements (DOE), gratings, and single-mode or multi-mode waveguides.
OrmoComp®: DE 30 210 075 433; IR 1 091 982 ; TW 100030626; OrmoClear®: DE 30 210 075 434; IR 1 091 359 ; TW 100030628; OrmoStamp®: DE 30 210 075 435; IR 1 092 621 ; TW 100030629; OrmoPrime®: DE 30 210 075 436
Positive Photoresists for UV lithography (mask aligner, laser, greyscale exposure) and e-beam lithography
Photoresists for UV (mask aligner, laser)/ DUV and e-beam lithography
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