ma-D 331/S – Microresist

LATEST NEWS

Save the date for the NIL INDUSTRIAL DAY 2025 in Vienna May 5-6 2025 – See nil-industrialday.org ~ Please join our next mrt Webinar – Meet the expert – in April with Gerda Ekindorf from Heidelberg Instruments “Grayscale exposure challenges using direct-write laser exposure on thick positive resist”

+49 30 641 670 100

info@microresist.de

ma-D 331/S

Apllication

aqueous-alkaline based & surfactant containing developer for photoresists

Characteristics

- aqueous-alkaline & surfactant containing NaOH based developer for photoresist series: ma-P 1200 & ma-N 400

- Puddle, immersion and spray development

Suitable Resists:

ma-N 400 series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV

quotation request

Contact us:

0