Therefore, we are proud to announce that we will participate in SPIE Advanced Lithography + Patterning in San Jose, California this year. Our expert team is looking forward to meeting you during the technical exhibition at booth #520.

Furthermore, we are delighted to contribute to the scientific conference with the following oral and post presentations:

• Pushing deep greyscale lithography beyond 100 µm pattern depth with a novel photoresist
  C. Schuster, G. Ekindorf, A. Voigt, A. Schleunitz, G. Grützner
• Novel approach of patterning technologies enabling monolithic micro-optical components
  J. Wolf, M. Ferstl, A. Voigt, S. Grützner, A. Schleunitz, G. Grützner
• Cross-functional photoresists and photopolymers enhancing micro- and nanofabrication
  A. Schleunitz, C. Schuster, A. Voigt, M. Russew, M. Lohse,
  M. Heinrich, G. Grützner

See you in San Jose from 26 February to 02 March 2023 at SPIE Advanced Lithography + Patterning:

https://spie.org/conferences-and-exhibitions/advanced-lithography-and-patterning