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ma-P 1200 series / ma-P 1275HV
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Unique Features

  • Film thickness up to 60 μm in one spin-coating step
  • Broadband-, g- and i-line exposure
  • High stability in acid and alkaline plating baths
  • High dry and wet etch resistance
  • Good thermal stability of the resist patterns attainable
  • Aqueous alkaline development
  • Side wall angle up to 87° with mask aligner broadband exposure
  • Suitable for pattern reflow

Applications

  • Etch mask - metals and semiconductors
  • Mould for electroplating
  • Fabrication of micro optical components, e.g. micro lenses by pattern transfer from reflowed resist patterns
  • Mask for ion implantation
ma-P 1200 series and ma-P 1275 & ma-P 1275HV for microsystems technology and microelectronics
Positive Photoresist Series and Thick Film Photoresists for UV lithography
Resist ma-P 1205 ma-P 1210 ma-P 1215 ma-P 1225 ma-P 1240 ma-P 1275 ma-P 1275HV
Film Thickness [µm]
spin coating @ 3000 rpm		 0.5 1.0 1.5 2.5 4.0 7.5

(up to 40 µm at lower spin speed)

 11

(up to 50 µm at lower spin speeds)
dyn. Viscosity [mPas]

(@ 25 °C, 1000 s-1)

 5 12 22 50 125 460 1100
Prebake 100 - 105°C
Spectral Sensitivity 350 - 450nm

i-line - 365 nm; h-line - 405 nm; g-line 436 nm
Exposure Dose

Hg lamp @ 365 nm

UV-LED monochromatic

 35 - 4000 mJ/cm2      (0.5 - 50 µm film thickness)

1000 - 4000 mJ/cm2    (> 10 µm film thickness)
Developer mr-D 526/S (TMAH based) - for greyscale lithography

ma-D 331 (NaOH based) - for standard binary lithography
Remover mr-Rem 700 (NMP & NEP free)

mr-Rem 500 (NMP free)

ma-R 404/S (strongly alkaline)
Recommended process chemicals:
Thinner ma-T 1050
Developer mr-D 526/S (TMAH based)
ma-D 331 (NaOH based)
Remover mr-Rem 700 (NMP & NEP free)
mr-Rem 500 (NMP free)
ma-R 404/S (strongly alkaline)

quotation request
Hybrid Polymers, Positive Photoresists
Read more...
Blog_microlensarrays_byReflow_and_moulding_Schuster_Klein_reflow_widget
Manufacturing Microlens Arrays by Reflow and UV Moulding
A cost-efficient method for the manufacturing of micro lens arrays is the reflow of patterned positive resists ma-P 1200G or ma-P 1200 and subsequent pattern transfer using OrmoStamp® or OrmoComp®.
Positive Photoresists
Hybrid Polymers
Thermal reflow
3D microstructures
Micro Optics
Wafer-level-optics
ma-P 1200 series / ma-P 1275HV
ma-P 1200G series
OrmoStamp
OrmoComp
23. Juni 2020
Hybrid Polymers, Positive Photoresists
Read more...
Blog_optical3Dpatterning_greyscale_Schuster_3d_patterning_process
Optical 3D patterning by greyscale lithography and UV moulding
An excellent method for the manufacturing of optical 3D structures is grayscale patterning of positive resist ma-P 1200G and subsequent pattern transfer by UV moulding using OrmoStamp® and OrmoComp®.
Positive Photoresists
Hybrid Polymers
Greyscale lithography
Micro Optics
Wafer-level-optics
Nanoimprint lithography (UV- or photo-NIL) for permanent application
ma-P 1200 series / ma-P 1275HV
OrmoStamp
OrmoComp
23. Juni 2020

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