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Solvent based remover for photoresists
- Organic solvent based remover for photoresist series: ma-P 1200, ma-P 1200 G, ma-P 1200 LIL, ma-N 2400, ma-N 400, ma-N 1400, mr-PL, PMMA, LOR, PMGI
- NMP free, NEP containing
- Puddle, immersion and spray development
ma-N 2400 series, ma-N 400 series, ma-N 1400 series, mr-EBL 6000 series, mr-DWL series, EpoCore & EpoClad series, ma-P 1200G series, ma-P 1200 series/ ma-P 1275HV, ma-P 1200LIL series, InkEpo series, mr-UVCur26SF series, SU-8 series, SU-8 2000 series, SU-8 3000 series, SU-8 TF 6000 series, PMMA/Copolymers, LOR / PMGI series
